The Application of Nano-SiOxCoatings as Migration Resistance Layer by Plasma Enhanced Chemical Vapor
Form: Author: Data: 2014-08-20
Fei Fei, Chen Qiang, Liu Zhongwei,Liu Fuping, Anastasiia Solodovnyk,
The Application of Nano-SiOxCoatings as Migration Resistance Layer by Plasma Enhanced Chemical Vapor Deposition,
Plasma Chem Plasma Process DOI 10.1007/s11090-012-9370-3
