Amine-containing film deposited in pulsed dielectric barrier discharge at a high pressure and its ce
Form: Author: Data: 2014-06-14
Hu Wenjuan, Xie Fenyan, Chen Qiang, Weng Jing,
Amine-containing film deposited in pulsed dielectric barrier discharge at a high pressure and its cell adsorption behaviors,
Chinese Physics B, 18(2009) 1276-1282 (SCI)
