Humid Blocking of SiOx f ilms Grown by RF Plasma Enhanced Chemical Vapor Deposition
Form: Author: Data: 2014-06-21
E. L. Han, Q. Chen, Y. J. Ge,
Humid Blocking of SiOx f ilms Grown by RF Plasma Enhanced Chemical Vapor Deposition,
Chinese J. of Vacuum Science and Technology, 26(6)(2006) 482-486 (in Chinese)
