High vapor barrier thin films deposited by R.F.-discharge plasma enhanced CVD
Form: Author: Data: 2014-08-05
Yuefei Zhang, Qiang Chen, Yu Wang, Guangqiu Zhang, Yuanjing Ge,
High vapor barrier thin films deposited by R.F.-discharge plasma enhanced CVD,
The 15th IAPRI World Conference on Packaging, Tokyo, Japan, October 3-6, 2006
Copyright©2004-2009 LPPM All Rights Reserved.
