Area-Selective Atomic Layer Deposition of Al2O3/ZnO Using Self-Assembled Monolayer
Form: Author: Data: 2014-12-05
Delin Kong, Ceming Wang, Jianming Xue, Lizhen Yang,
Area-Selective Atomic Layer Deposition of Al2O3/ZnO Using Self-Assembled Monolayer,
2nd International Conference on ALD Applications & 3rd China ALD conference£¿, 2014.10-14-17, Shanghai, China(oral)
