Influence of magneticfield on the reaction mechanisms of plasma-assisted atomic layer deposition of

Form:    Author:    Data: 2014-08-21
Xingcun Li, Wenwen Lei, Qiao Zhao, Qiang Chen,
Influence of magneticfield on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3,
Surface & Coatings Technology 228 (2013) S55–S60